Microelectronic test pattern NBS-3 for evaluating the resistivity-dopant density relationship of silicon /
Martin G. Buehler.

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Main Author: Buehler, Martin G.
Language(s): English
Published: [Washington] : U.S. Dept. of Commerce, National Bureau of Standards : 1976.
Subjects: Microélectronique.
Silicium > Silicium / Essais.
Semiconducteurs > Semiconducteurs / Essais.
Microelectronics.
Silicon > Silicon / Testing.
Semiconductors > Semiconductors / Testing.
Physical Description: vi, 49 p. : ill. ; 26 cm.
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Item Link	Original Source
Full view	Technical Report Archive & Image Library
Full view 400-22	University of Illinois at Urbana-Champaign

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