A BASIC program for calculating dopant density profiles from capacitance-voltage data /
Richard L. Mattis and Martin G. Buehler.

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Main Author: Mattis, Richard L.
Related Names: Buehler, Martin G., joint author.
United States. National Bureau of Standards.
Language(s): English
Published: Washington : U.S. Dept. of Commerce, National Bureau of Standards : 1975.
Subjects: Ions > Ions / Implantation > Ions / Implantation / Informatique.
Diodes à semiconducteur > Diodes à semiconducteur / Informatique.
Mesures électriques > Mesures électriques / Informatique.
BASIC (Computer program language)
Electric measurements > Electric measurements / Data processing.
Diodes, Semiconductor > Diodes, Semiconductor / Data processing.
Ion implantation > Ion implantation / Data processing.
Physical Description: v, 33 p. : ill. ; 26 cm.
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