Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing /
sponsored and published by SPIE--the International Society for Optical Engineering.

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Previous Title
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing
Related Names
Semiconductor Equipment and Materials International.
Society of Photo-Optical Instrumentation Engineers.
Language(s)
English
Published
Bellingham, Wash. : SPIE, c1995-
Subjects
Integrated circuits > Masks > Congresses.
Ion beam lithography > Congresses.
X-ray lithography > Congresses.
Lithography, Electron beam > Congresses.
Physical Description
v. : ill. ; 28 cm.
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Item Link Original Source
Limited (search only)   1995 University of Michigan
Limited (search only)   1995 University of Michigan
Limited (search only)   1996 University of Michigan