Advanced applications of ion implantation :
January 23-25, 1985, Los Angeles, California /
Michael I. Current, Devendra K. Sadana, chairmen/editors ; in cooperation with SIRA Ltd.--The Research Association for Instrumentation.

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Related Names
Sadana, Devendra K.
Current, Michael I.
Sira Institute.
Language(s)
English
Published
Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1985.
Subjects
Semiconductor doping > Congresses.
Ion implantation > Congresses.
Physical Description
vi, 263 p. : ill. ; 28 cm.
ISBN
0892525657
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