Advanced applications of ion implantation : January 23-25, 1985, Los Angeles, California

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245 0 0 ‡aAdvanced applications of ion implantation : ‡bJanuary 23-25, 1985, Los Angeles, California / ‡cMichael I. Current, Devendra K. Sadana, chairmen/editors ; in cooperation with SIRA Ltd.--The Research Association for Instrumentation.
260 ⊔ ⊔ ‡aBellingham, Wash. : ‡bSPIE--the International Society for Optical Engineering, ‡cc1985.
300 ⊔ ⊔ ‡avi, 263 p. : ‡bill. ; ‡c28 cm.
336 ⊔ ⊔ ‡atext ‡btxt ‡2rdacontent
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490 0 ⊔ ‡aProceedings of SPIE--the International Society for Optical Engineering ; ‡vv. 530
504 ⊔ ⊔ ‡aIncludes bibliographical references and index.
538 ⊔ ⊔ ‡aMode of access: Internet.
650 ⊔ 0 ‡aSemiconductor doping ‡vCongresses. ‡0http://id.loc.gov/authorities/subjects/sh2010112585
650 ⊔ 0 ‡aIon implantation ‡vCongresses. ‡0http://id.loc.gov/authorities/subjects/sh2008104909
700 1 ⊔ ‡aSadana, Devendra K.
700 1 ⊔ ‡aCurrent, Michael I.
710 2 ⊔ ‡aSira Institute. ‡0http://id.loc.gov/authorities/names/n80125003 ‡1http://id.loc.gov/rwo/agents/n80125003
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