Modeling and calibration of resist processes in photolithography /
by Lei Yuan.

Description

Main Author

Yuan, Lei.

Language(s)

English

Published

2005.

Subjects

University of California, Berkeley. > University of California, Berkeley. / Dept. of Engineering > University of California, Berkeley. / Dept. of Engineering / Dissertations.

Physical Description

xi, 160 leaves : ill. ; 28 cm.

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