Modeling and calibration of resist processes in photolithography

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035	⊔	⊔	‡a(OCoLC)74712906
100	1	⊔	‡aYuan, Lei.
245	1	0	‡aModeling and calibration of resist processes in photolithography / ‡cby Lei Yuan.
260	⊔	⊔	‡c2005.
300	⊔	⊔	‡axi, 160 leaves : ‡bill. ; ‡c28 cm.
502	⊔	⊔	‡aThesis (Ph.D. in Engineering-Mechanical Engineering)--University of California, Berkeley, Spring 2005.
504	⊔	⊔	‡aIncludes bibliographical references (leaves 149-160).
538	⊔	⊔	‡aMode of access: Internet.
610	2	0	‡aUniversity of California, Berkeley. ‡bDept. of Engineering ‡xDissertations.
690	⊔	⊔	‡aDissertations, Academic ‡xUCB ‡xMechanical Engineering ‡y2001-2010.
CID	⊔	⊔	‡a100905673
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