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‡aFundamentals of high-resolution lithography, February 23, 1979, San Francisco /
‡cContinuing Education in Engineering, University Extension, and the College of Engineering, University of California, Berkeley.
|
260 |
⊔ |
⊔ |
‡aBerkeley :
‡bContinuing Education in Engineering, University Extension, University of California,
‡c1979.
|
300 |
⊔ |
⊔ |
‡aapproximately 250 pages :
‡billustrations ;
‡c28 cm
|
336 |
⊔ |
⊔ |
‡atext
‡btxt
‡2rdacontent
|
337 |
⊔ |
⊔ |
‡aunmediated
‡bn
‡2rdamedia
|
338 |
⊔ |
⊔ |
‡avolume
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|
504 |
⊔ |
⊔ |
‡aIncludes bibliographical references.
|
538 |
⊔ |
⊔ |
‡aMode of access: Internet.
|
650 |
⊔ |
7 |
‡aPhotolithography.
‡2fast
‡0(OCoLC)fst01062032
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⊔ |
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‡aLithography.
‡2fast
‡0(OCoLC)fst01000265
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‡alithography.
‡2aat
|
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⊔ |
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‡aphotolithography.
‡2aat
|
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⊔ |
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‡aLithographie.
|
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⊔ |
6 |
‡aPhotolithographie.
|
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⊔ |
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‡aLithography.
|
650 |
⊔ |
0 |
‡aPhotolithography.
|
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2 |
⊔ |
‡aUniversity of California, Berkeley.
‡bCollege of Engineering.
|
710 |
2 |
⊔ |
‡aUniversity of California, Berkeley.
‡bContinuing Education in Engineering.
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