The basics of ion implantation : technology, equipment, and process

LDR 01014nam a2200301Ia 4500
001 102011646
002 u3566381
003 MiAaHDL
005 20171207000000.0
006 m d
007 cr bn ---auaua
008 001006s1997 txua b 000 0 eng d
020 ⊔ ⊔ ‡a1889381020
035 ⊔ ⊔ ‡asdr-uva.u3566381
035 ⊔ ⊔ ‡a(Sirsi) o45132479
035 ⊔ ⊔ ‡a(OCoLC)45132479
040 ⊔ ⊔ ‡aVA@ ‡cVA@
049 ⊔ ⊔ ‡aVA@@
090 ⊔ ⊔ ‡aQC702.7.I55 ‡bB38 1997
245 1 4 ‡aThe basics of ion implantation : ‡btechnology, equipment, and process / ‡cedited by M.I. Current.
250 ⊔ ⊔ ‡a1st ed.
260 ⊔ ⊔ ‡aAustin, TX : ‡bIon Beam Press, ‡c1997.
300 ⊔ ⊔ ‡a1 v. (various pagings) : ‡bill. ; ‡c28 cm.
500 ⊔ ⊔ ‡aSubtitle on cover: Process, equipment, and technology.
504 ⊔ ⊔ ‡aIncludes bibliographical references.
538 ⊔ ⊔ ‡aMode of access: Internet.
590 ⊔ ⊔ ‡aVIVA Repository Copy 2014.
596 ⊔ ⊔ ‡a5
650 ⊔ 0 ‡aIon implantation.
700 1 ⊔ ‡aCurrent, Michael I.
CID ⊔ ⊔ ‡a102011646
DAT 0 ⊔ ‡a20001006150344.0 ‡b20171207000000.0
DAT 1 ⊔ ‡a20171213100613.0 ‡b2023-10-18T17:51:28Z
DAT 2 ⊔ ‡a2023-10-18T17:30:02Z
CAT ⊔ ⊔ ‡aSDR-UVA ‡dUNKNOWN ‡lprepare.pl-004-007
FMT ⊔ ⊔ ‡aBK
HOL ⊔ ⊔ ‡0sdr-uva.u3566381 ‡auva ‡bSDR ‡cUVA ‡puva.x004465111 ‡sUVA ‡1u3566381
974 ⊔ ⊔ ‡bUVA ‡cUVA ‡d20231018 ‡sgoogle ‡uuva.x004465111 ‡y1997 ‡ric ‡qbib ‡tUS bib date1 >= 1930