Development of a polysilicon process based on chemical vapor deposition (phase 1) :
second quarterly progress report, January 1-March 31, 1980 /
K. Sharp [and three others], Hemlock Semiconductor Corporation.

Description

Corporate Author

Hemlock Semiconductor Corporation.

Related Names

Sawyer, D.
Plahutnik, F.
Arvidson, A.
Sharp, K.
United States. Department of Energy.
Jet Propulsion Laboratory (U.S.)

Language(s)

English

Published

Washington, D.C. : U.S. Department of Energy, Solar Energy, 1980.

Subjects

Chemical processes.
Silicon > Silicon / Industrial applications > Silicon / Industrial applications / United States.
Chemical vapor deposition > Chemical vapor deposition / United States.

Note

"May 1980."
"DOE/JPL/955533-79-2."
Cover title.

Physical Description

iv, 49 pages : illustrations ; 27 cm.

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