Catalog Record: Low Temperature Plasma Etching Control through Ion Energy Angular Distribution and 3-Dimensional Profile Simulation | HathiTrust Digital Library

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Low Temperature Plasma Etching Control through Ion Energy Angular Distribution and 3-Dimensional Profile Simulation
[electronic resource].

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Main Author: Zhang, Yiting.
Language(s): English
Published: 2015.
Subjects: Plasma etching.
Wafer fabrication.
Ion energy angular distribution.
Profile simulation.
Plasma physics and chemistry.
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Item Link Original Source
Limited (search only) University of Michigan
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