X-ray photoelectron spectroscopy study of radiofrequency-sputtered refractory-compound--steel interfaces /
Donald R. Wheeler, and William A. Brainard.

Description

Main Author

Wheeler, Donald R.

Related Names

Brainard, William A., joint author.
United States. National Aeronautics and Space Administration.

Language(s)

English

Published

Washington : National Aeronautics and Space Administration, Scientific and Technical Information Office ; 1978.

Subjects

Surface chemistry.
Refractory coating.
Sputtering (Physics)

Summary

Radiofrequency sputtering was used to deposit Mo2C, Mo2B5, and MoSi2 coatings on 440C steel substrates. Both sputter etched and preoxidized substrates were used, and the films were deposited with and without a substrate bias of -300 V. The composition of the coatings was measured as a function of depth by X-ray photoelectron spectroscopy combined with argon ion etching. In the interfacial region there was evidence that bias produced a graded interface in Mo2B5 but not in Mo2C. Oxides of iron and of all film constituents except carbon were presented in all cases but the iron oxide concentration was higher and the layer thicker on the preoxidized substrates. The film and iron oxides were mixed in the MoSi2 and Mo2C films but layered in the Mo2B5 film. The presence of mixed oxides correlates with enhanced film adhesion.

Note

Issued Feb. 1978.

Physical Description

17 p. : ill. ; 27 cm.

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