Catalog Record: Semiconductor measurement technology : results of the Monte Carlo calculation of one- and two-dimensional distributions of particles and damage : ion implanted dopants in silicon | HathiTrust Digital Library

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Semiconductor measurement technology :
results of the Monte Carlo calculation of one- and two-dimensional distributions of particles and damage : ion implanted dopants in silicon /
John Albers.

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Main Author: Albers, John.
Language(s): English
Published: Gaithersburg, MD : U.S. Dept. of Commerce, National Bureau of Standards ; 1987.
Subjects: Semiconductors > Semiconductors / Measurement.
Semiconductor doping.
Silicon.
Particle range (Nuclear physics) > Particle range (Nuclear physics) / Mathematical models.
Scattering (Physics) > Scattering (Physics) / Mathematical models.
Monte Carlo method.
Physical Description: iv, 667 p. : ill. ; 28 cm.
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