Some aspects of dose measurement for accurate ion implantation

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086 0 ‡aC 13.10:400-39.
100 1 ‡aJamba, Douglas M.
245 1 0 ‡aSome aspects of dose measurement for accurate ion implantation / ‡cDouglas M. Jamba.
260 ‡aWashington, D.C. : ‡bU.S. Dept. of Commerce, National Bureau of Standards : ‡bFor sale by the Supt. of Docs., U.S. Govt. Print. Off., ‡c1977.
300 ‡avii, 36 p. : ‡bill. ; ‡c26 cm.
490 0 ‡aU.S. Department of Commerce National Bureau of Standards special publication ; ‡v400-39
504 ‡aIncludes bibliographical references (p. 36).
538 ‡aMode of access: Internet.
650 0 ‡aIon implantation.
650 0 ‡aRadiation dosimetry.
710 1 ‡aUnited States. ‡bNational Bureau of Standards. ‡tSpecial publication.
CID ‡a006865952
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CAT ‡aSDR-MIU-UPD ‡dEX LIBRIS - ALEPH ‡lloader.pl-003-000
COM ‡d20130330 ‡mThis record was modified while in the University of Michigan Aleph system for one of the following reasons: to resolve an incorrect bibliographically determined rights status, to include a new OCLC number, or to otherwise address or update incorrect or incomplete metadata.
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