Electrochemical anodic reaction rate of vanadium metal with molten VCl₂-VCl₃-NaCl mixtures

LDR 01186cam a2200313Ia 4500
001 005951031
003 MiAaHDL
005 20221205000000.0
006 m d
007 cr bn ---auaua
008 750224s1974 dcua f000 0 eng d
035 ‡a(MiU)990059510310106381
035 ‡asdr-miu.990059510310106381
035 ‡z(MiU)MIU01000000000000005951031-goog
035 ‡a(OCoLC)1185741
035 ‡z(MiU)Aleph005951031
040 ‡aUDI ‡cUDI ‡dOCLCQ ‡dLHL ‡dBOMRI
049 ‡aBMRA
086 0 ‡aI 28.23:7986
100 1 ‡aRaddatz, A. E. ‡q(Andrea E.)
245 1 0 ‡aElectrochemical anodic reaction rate of vanadium metal with molten VCl₂-VCl₃-NaCl mixtures / ‡cby A.E. Raddatz and D.J. MacDonald.
260 ‡a[Washington, D.C.] : ‡bU.S. Bureau of Mines, ‡c[1974]
300 ‡a9 p. : ‡billus., tables ; ‡c26 cm.
490 0 ‡aReport of investigations / United States. Bureau of Mines ; ‡v7986
504 ‡aIncludes bibliographical references.
538 ‡aMode of access: Internet.
650 0 ‡aVanadium ‡xElectrometallurgy.
700 1 ‡aMacDonald, D. J. ‡q(David J.), ‡ejoint author.
740 0 1 ‡aVanadium metal-vanadium subchloride system.
899 ‡a39015078484261
CID ‡a005951031
DAT 0 ‡a20080826042005.0 ‡b20221205000000.0
DAT 1 ‡a20221206110740.0 ‡b2024-02-23T18:56:21Z
CAT ‡aSDR-MIU ‡cmiu ‡dALMA ‡lprepare.pl-004-008
FMT ‡aBK
HOL ‡0sdr-miu.990059510310106381 ‡aMiU ‡bSDR ‡cGWLA ‡f005951031 ‡pmdp.39015078484261 ‡sMIU ‡1990059510310106381
974 ‡bMIU ‡cGWLA ‡d20240223 ‡sgoogle ‡umdp.39015078484261 ‡y1974 ‡rpd ‡qbib ‡tUS fed doc