A production-compatible microelectronic test pattern for evaluating photomask misalignment /
T. J. Russell, D. A. Maxwell ; sponsored by the

Description

Main Author

Russell, T. J. (Thomas James), 1943-

Related Names

Maxwell, Dwight A., joint author.
United States. Advanced Research Projects Agency.
United States. National Bureau of Standards.

Language(s)

English

Published

Washington : U. S. Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U. S. Govt. Print. Off., 1979.

Subjects

Integrated circuits > Integrated circuits / Masks > Integrated circuits / Masks / Testing.

Physical Description

iii, 28 p. : ill. ; 26 cm.

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