MEMS reliability for critical applications : 20 September 2000, Santa Clara, USA

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245 0 0 ‡aMEMS reliability for critical applications : ‡b20 September 2000, Santa Clara, USA / ‡cRussell A. Lawton, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SolidState Technology, [and] Sandia National Laboratories (USA).
246 3 ‡aMicroelectromechanical systems reliability for critical applications
260 ‡aBellingham, Wash., USA : ‡bSPIE, ‡cc2000.
300 ‡av, 146 p. : ‡bill. ; ‡c28 cm.
336 ‡atext ‡btxt ‡2rdacontent
337 ‡aunmediated ‡bn ‡2rdamedia
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490 0 ‡aSPIE proceedings series ; ‡vv. 4180
504 ‡aIncludes bibliographical references and index.
538 ‡aMode of access: Internet.
650 0 ‡aMicroelectromechanical systems ‡xReliability ‡vCongresses.
700 1 ‡aLawton, Russell A.
710 2 ‡aSandia National Laboratories. ‡0http://id.loc.gov/authorities/names/n80115974 ‡1http://id.loc.gov/rwo/agents/n80115974
710 2 ‡aSolid State Technology (Organization) ‡0http://id.loc.gov/authorities/names/n98059169 ‡1http://id.loc.gov/rwo/agents/n98059169
710 2 ‡aSemiconductor Equipment and Materials International. ‡0http://id.loc.gov/authorities/names/n90682619 ‡1http://id.loc.gov/rwo/agents/n90682619
710 2 ‡aSociety of Photo-Optical Instrumentation Engineers. ‡0http://id.loc.gov/authorities/names/n78088934 ‡1http://id.loc.gov/rwo/agents/n78088934
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