LDR | |
02239nas a2200409 a 4500 |
001 |
|
002882597 |
003 |
|
MiAaHDL |
005 |
|
20250112000000.0 |
006 |
|
m d |
007 |
|
cr bn ---auaua |
007 |
|
cr bn ---aaaua |
008 |
|
941010d19uu1991wauar 1 0eng d |
035 |
⊔ |
⊔ |
‡a(MiU)990028825970106381
|
035 |
⊔ |
⊔ |
‡asdr-miu.990028825970106381
|
035 |
⊔ |
⊔ |
‡z(MiU)MIU01000000000000002882597-goog
|
035 |
⊔ |
⊔ |
‡a(OCoLC)1179168918
|
035 |
⊔ |
⊔ |
‡z(MiU)Aleph002882597
|
040 |
⊔ |
⊔ |
‡aRVE
‡cRVE
‡dEYM
‡dUtOrBLW
|
111 |
2 |
⊔ |
‡aSymposium on Photomask Technology.
‡0http://id.loc.gov/authorities/names/nr00012683
‡1http://id.loc.gov/rwo/agents/nr00012683
|
245 |
1 |
0 |
‡aAnnual Symposium on Photomask Technology :
‡bproceedings.
|
246 |
1 |
0 |
‡aPhotomask technology
|
246 |
1 |
0 |
‡aProceedings
|
260 |
⊔ |
⊔ |
‡aBellingham, Wash. :
‡bSPIE--the International Society for Optical Engineering,
‡c-1991.
|
300 |
⊔ |
⊔ |
‡av. :
‡bill. ;
‡c28 cm.
|
310 |
⊔ |
⊔ |
‡aAnnual
|
336 |
⊔ |
⊔ |
‡atext
‡btxt
‡2rdacontent
|
337 |
⊔ |
⊔ |
‡acomputer
‡bc
‡2rdamedia
|
338 |
⊔ |
⊔ |
‡aonline resource
‡bcr
‡2rdacarrier
|
362 |
1 |
⊔ |
‡aCeased with: 11th (1991).
|
490 |
0 |
⊔ |
‡a-1991: Proceedings / SPIE
|
500 |
⊔ |
⊔ |
‡aDescription based on: 11th (1991).
|
538 |
⊔ |
⊔ |
‡aMode of access: Internet.
|
550 |
⊔ |
⊔ |
‡aSponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask Technology, -1991.
|
650 |
⊔ |
0 |
‡aMicrolithography
‡vCongresses.
‡0http://id.loc.gov/authorities/subjects/sh2008107753
|
650 |
⊔ |
0 |
‡aIntegrated circuits
‡xMasks
‡vCongresses.
‡0http://id.loc.gov/authorities/subjects/sh2008104740
|
710 |
2 |
⊔ |
‡aSociety of Photo-Optical Instrumentation Engineers.
‡0http://id.loc.gov/authorities/names/n78088934
‡1http://id.loc.gov/rwo/agents/n78088934
|
710 |
2 |
⊔ |
‡aBACUS (Technical group)
‡0http://id.loc.gov/authorities/names/n92089299
‡1http://id.loc.gov/rwo/agents/n92089299
|
730 |
0 |
⊔ |
‡aSPIE digital library.
‡0http://id.loc.gov/authorities/names/no2006030688
‡1http://id.loc.gov/rwo/agents/no2006030688
‡1http://viaf.org/viaf/181712398
|
785 |
0 |
0 |
‡aSymposium on Photomask Technology and Management.
‡tAnnual Symposium on Photomask Technology and Management.
|
899 |
⊔ |
⊔ |
‡a39015025206536
‡cv.11 1991
|
CID |
⊔ |
⊔ |
‡a002882597
|
DAT |
0 |
⊔ |
‡a20241217221843.0
‡b20250112000000.0
|
DAT |
1 |
⊔ |
‡a20250112223409.0
‡b2025-01-13T18:18:10Z
|
DAT |
2 |
⊔ |
‡a2023-08-06T17:30:02Z
|
CAT |
⊔ |
⊔ |
‡aSDR-MIU
‡cmiu
‡dALMA
‡lprepare.pl-004-009
|
FMT |
⊔ |
⊔ |
‡aSE
|
HOL |
⊔ |
⊔ |
‡0sdr-miu.990028825970106381
‡aMiU
‡bSDR
‡cMIU
‡f002882597
‡pmdp.39015025206536
‡sMIU
‡zv.11 1991
‡1990028825970106381
|
974 |
⊔ |
⊔ |
‡bMIU
‡cMIU
‡d20250113
‡sgoogle
‡umdp.39015025206536
‡zv.11 1991
‡y1991
‡ric
‡qbib
‡tUS serial item date >= 1930
|