CW beam processing of silicon and other semiconductors

LDR			01182nam a22002897a 4500
001			002583896
003			MiAaHDL
005			20250105000000.0
006			m d
007			cr bn ---auaua
008			921215s1984 xxua b 001 0 eng d
020	⊔	⊔	‡a0127521178
035	⊔	⊔	‡a(MiU)990025838960106381
035	⊔	⊔	‡asdr-miu.990025838960106381
035	⊔	⊔	‡z(MiU)MIU01000000000000002583896-goog
035	⊔	⊔	‡a(OCoLC)11683740
035	⊔	⊔	‡z(MiU)Aleph002583896
040	⊔	⊔	‡aEUE ‡cEUE ‡dm/c ‡dEYM ‡dUtOrBLW
245	0	0	‡aCW beam processing of silicon and other semiconductors / ‡cvolume editor, James F. Gibbons.
260	⊔	⊔	‡aOrlando, Fla. : ‡bAcademic Press, ‡c1984.
300	⊔	⊔	‡axii, 458 p. : ‡bill. ; ‡c24 cm.
336	⊔	⊔	‡atext ‡btxt ‡2rdacontent
337	⊔	⊔	‡aunmediated ‡bn ‡2rdamedia
338	⊔	⊔	‡avolume ‡bnc ‡2rdacarrier
490	0	⊔	‡aSemiconductors and semimetals ; ‡vvol. 17
538	⊔	⊔	‡aMode of access: Internet.
650	⊔	0	‡aSilicon. ‡0http://id.loc.gov/authorities/subjects/sh85122512
650	⊔	0	‡aSemiconductor industry ‡xLaser use in. ‡0http://id.loc.gov/authorities/subjects/sh85119895
700	1	⊔	‡aGibbons, James F.
899	⊔	⊔	‡a39015004478866
CID	⊔	⊔	‡a002583896
DAT	0	⊔	‡a20241218010928.0 ‡b20250105000000.0
DAT	1	⊔	‡a20250106085723.0 ‡b2025-01-07T07:13:46Z
DAT	2	⊔	‡a2008-01-09T22:30:04Z
CAT	⊔	⊔	‡aSDR-MIU ‡cmiu ‡dALMA ‡lprepare.pl-004-009
FMT	⊔	⊔	‡aBK
HOL	⊔	⊔	‡0sdr-miu.990025838960106381 ‡aMiU ‡bSDR ‡cMIU ‡f002583896 ‡pmdp.39015004478866 ‡sMIU ‡1990025838960106381
974	⊔	⊔	‡bMIU ‡cMIU ‡d20250107 ‡sgoogle ‡umdp.39015004478866 ‡y1984 ‡ric ‡qbib ‡tUS bib date1 >= 1930
974	⊔	⊔	‡bMIU ‡cMIU ‡d20250107 ‡sgoogle ‡umdp.39015004463512 ‡y1984 ‡ric ‡qbib ‡tUS bib date1 >= 1930