| LDR | 01279nam a2200349 a 4500 | ||
| 001 | 002227961 | ||
| 003 | MiAaHDL | ||
| 005 | 20220528000000.0 | ||
| 006 | m d | ||
| 007 | cr bn ---auaua | ||
| 008 | 910104s1990 ne a b 00110 eng | ||
| 010 | ⊔ | ⊔ | ‡a89023513 |
| 020 | ⊔ | ⊔ | ‡a0444988017 : |
| 035 | ⊔ | ⊔ | ‡a(MiU)990022279610106381 |
| 035 | ⊔ | ⊔ | ‡asdr-miu.990022279610106381 |
| 035 | ⊔ | ⊔ | ‡z(MiU)MIU01000000000000002227961-goog |
| 035 | ⊔ | ⊔ | ‡a(OCoLC)20318559 |
| 035 | ⊔ | ⊔ | ‡z(MiU)Aleph002227961 |
| 040 | ⊔ | ⊔ | ‡aDLC ‡cDLC ‡dEYM |
| 041 | 1 | ⊔ | ‡aengrum |
| 050 | 0 | ⊔ | ‡aTS695 ‡b.M6713 1990 |
| 082 | 0 | ⊔ | ‡a671.7/35 ‡220 |
| 100 | 1 | ⊔ | ‡aMoroșanu, C. E. |
| 240 | 1 | 0 | ‡aDepunerea chimică din vapori a straturilor subțiri. ‡lEnglish |
| 245 | 1 | 0 | ‡aThin films by chemical vapour deposition / ‡cC.E. Moroșanu. |
| 260 | ⊔ | ⊔ | ‡aAmsterdam ; ‡aNew York : ‡bElsevier ; ‡aBucharest, Romania : ‡bEditura Tehnică, ‡c1990. |
| 300 | ⊔ | ⊔ | ‡a717 p. : ‡bill. ; ‡c25 cm. |
| 490 | 0 | ⊔ | ‡aThin films science and technology ; ‡vvol. 7 |
| 500 | ⊔ | ⊔ | ‡aRev., updated, and enl. translation of: Depunerea chimică din vaporie a straturilor subțiri. |
| 504 | ⊔ | ⊔ | ‡aIncludes bibliographical references. |
| 538 | ⊔ | ⊔ | ‡aMode of access: Internet. |
| 650 | ⊔ | 0 | ‡aSemiconductors. |
| 650 | ⊔ | 0 | ‡aThin films. |
| 650 | ⊔ | 0 | ‡aVapor-plating. |
| 899 | ⊔ | ⊔ | ‡a39015018938558 |
| CID | ⊔ | ⊔ | ‡a002227961 |
| DAT | 0 | ⊔ | ‡a19910104000000.0 ‡b20220528000000.0 |
| DAT | 1 | ⊔ | ‡a20220530201409.0 ‡b2022-12-14T18:57:41Z |
| CAT | ⊔ | ⊔ | ‡aSDR-MIU ‡dALMA ‡lprepare.pl-004-008 |
| FMT | ⊔ | ⊔ | ‡aBK |
| HOL | ⊔ | ⊔ | ‡0sdr-miu.990022279610106381 ‡aMiU ‡bSDR ‡cMIU ‡pmdp.39015018938558 ‡sMIU ‡1990022279610106381 |
| 974 | ⊔ | ⊔ | ‡bMIU ‡cMIU ‡d20221214 ‡sgoogle ‡umdp.39015018938558 ‡y1990 ‡ric ‡qbib ‡tnon-US bib date1 >= 1929 |