Surface chemistry, theory and industrial applications

LDR 00884nam a22002771 4500
001 001114243
003 MiAaHDL
005 20210817000000.0
006 m d
007 cr bn ---auaua
008 890623s1962 nyua b 00000 eng d
010 ‡a62020782 /L/r83
035 ‡a(MiU)990011142430106381
035 ‡asdr-miu.990011142430106381
035 ‡a(OCoLC)5723781
035 ‡a(SAZTEC)108202720
035 ‡a(SAZTEC)108202710
035 ‡a(CaOTULAS)176074030
035 ‡z(MiU)Aleph001114243
040 ‡aDLC/ICU ‡cICU
050 0 0 ‡aQD506 ‡b.O8
082 0 ‡a541.3453
100 1 ‡aOsipow, Lloyd I.
245 0 0 ‡aSurface chemistry, ‡btheory and industrial applications.
260 ‡aNew York, ‡bReinhold Pub. Corp. ‡c[1962]
300 ‡a473 p. ‡billus. ‡c24 cm.
490 0 ‡aAmerican Chemical Society. Monograph series, ‡vno. 153
504 ‡aIncludes bibliography.
538 ‡aMode of access: Internet.
650 0 ‡aSurface chemistry
CID ‡a001114243
DAT 0 ‡a19890623000000.0 ‡b20210817000000.0
DAT 1 ‡a20210919140713.0 ‡b2022-11-21T18:31:59Z
CAT ‡aSDR-MIU ‡dALMA ‡lprepare.pl-004-008
FMT ‡aBK
HOL ‡0sdr-miu.990011142430106381 ‡aMiU ‡bSDR ‡cMIU ‡pmdp.39015004524685 ‡sMIU ‡1990011142430106381
974 ‡bMIU ‡cMIU ‡d20221121 ‡sgoogle ‡umdp.39015004524685 ‡y1962 ‡rpd ‡qren