Laser processing of thin films and microstructures : oxidation, deposition, and etching of insulators

LDR 00941nam a22002651a 4500
001 000903999
003 MiAaHDL
005 20210817000000.0
006 m d
007 cr bn ---auaua
008 881103s1987 wb a b 00110 eng
010 ‡a87020660
020 ‡a0387179518 ‡q(U.S.)
035 ‡a(MiU)990009039990106381
035 ‡asdr-miu.990009039990106381
035 ‡a(OCoLC)16404257
035 ‡a(RLIN)MIUG88-B31484
035 ‡z(MiU)Aleph000903999
050 0 ‡aTA1677 ‡b.B69 1987
082 0 ‡a621.36/6 ‡219
100 1 ‡aBoyd, Ian W., ‡d1958-
245 1 0 ‡aLaser processing of thin films and microstructures : ‡boxidation, deposition, and etching of insulators / ‡cIan W. Boyd.
260 ‡aBerlin ; ‡aNew York : ‡bSpringer-Verlag, ‡cc1987.
300 ‡aviii, 320 p. : ‡b77 ill. ; ‡c24 cm.
490 0 ‡aSpringer series in materials science ; ‡v3
500 ‡aIncludes index.
504 ‡aBibliography: p. 287-313.
538 ‡aMode of access: Internet.
650 0 ‡aLasers ‡xIndustrial applications.
CID ‡a000903999
DAT 0 ‡a19881103000000.0 ‡b20210817000000.0
DAT 1 ‡a20210912090708.0 ‡b2023-10-24T17:31:50Z
CAT ‡aSDR-MIU ‡dALMA ‡lprepare.pl-004-008
FMT ‡aBK
HOL ‡0sdr-miu.990009039990106381 ‡aMiU ‡bSDR ‡cMIU ‡pmdp.39015012758093 ‡sMIU ‡1990009039990106381
974 ‡bMIU ‡cMIU ‡d20231024 ‡sgoogle ‡umdp.39015012758093 ‡y1987 ‡ric ‡qbib ‡tnon-US bib date1 >= 1929