Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies IV :
March 14-15, 1985, Santa Clara, California /
Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.

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Related Names: Blais, Phillip D.
International Society for Hybrid Microelectronics.
Language(s): English
Published: Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1985.
Subjects: Ion beam lithography > Ion beam lithography / Congresses.
Lithography, Electron beam > Lithography, Electron beam / Congresses.
X-ray lithography > X-ray lithography / Congresses.
Physical Description: vi, 219 p. : ill. ; 28 cm.
ISBN: 089252572X
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