Record

LDR 01756nas a22003251 4500
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003 MiAaHDL
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006 m d
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022 ⊔ ⊔ ‡a0586-2795
035 ⊔ ⊔ ‡a(MiU)990005041170106381
035 ⊔ ⊔ ‡asdr-miu.990005041170106381
035 ⊔ ⊔ ‡a(OCoLC)1767046
035 ⊔ ⊔ ‡a(CaOTULAS)160242712
035 ⊔ ⊔ ‡a(RLIN)MIUG24807-S
035 ⊔ ⊔ ‡z(MiU)Aleph000504117
040 ⊔ ⊔ ‡cMUL ‡dNIC ‡dNSDP ‡dMiU
042 ⊔ ⊔ ‡ansdp
111 2 ⊔ ‡aIEEE Symposium on Electron, Ion, and Laser Beam Technology.
222 1 0 ‡aRecord of the Symposium on Electron, Ion, and Laser Beam Technology
245 0 0 ‡aRecord.
247 0 0 ‡aProceedings ‡f1959-
260 ⊔ ⊔ ‡aSan Francisco [etc.] ‡bSan Francisco Press [etc.]
300 ⊔ ⊔ ‡av. ‡bill. ‡c29 cm.
362 0 ⊔ ‡a1st- 1959-
500 ⊔ ⊔ ‡aIssued as IEEE catalog no.
538 ⊔ ⊔ ‡aMode of access: Internet.
550 ⊔ ⊔ ‡aSymposia for 1959- sponsored by Alloyd General Corporation (called in earlier vols. Alloyd Research Corporation, Alloyd Corporation or Alloyd Electronics Corporation); sponsored - by the Group on Electron Devices of the Institute of Electrical and Electronics Engineers and the University of California, College of Engineering.
550 ⊔ ⊔ ‡aIssued by the symposium under its earlier names: 1st, Symposium on Electron-Beam Melting; 2d-3d, Symposium on Electron Beam Processes; 4th-5th, Symposium on Electron Beam Technology; 6th, Electron Beam Symposium; 7th-8th, Electron and Laser Beam Symposium; 9th, IEEE Symposium on Electron, Ion, and Laser Beam Technology.
650 ⊔ 0 ‡aElectron beams ‡vCongresses.
710 2 ⊔ ‡aUniversity of California, Berkeley. ‡bCollege of Engineering.
710 2 ⊔ ‡aInstitute of Electrical and Electronics Engineers. ‡bElectron Devices Group.
710 2 ⊔ ‡aAlloyd General Corporation, Cambridge, Mass.
CID ⊔ ⊔ ‡a000504117
DAT 0 ⊔ ‡a19880718000000.0 ‡b20210817000000.0
DAT 1 ⊔ ‡a20210925140719.0 ‡b2023-09-16T17:44:12Z
CAT ⊔ ⊔ ‡aSDR-MIU ‡dALMA ‡lprepare.pl-004-008
FMT ⊔ ⊔ ‡aSE
HOL ⊔ ⊔ ‡0sdr-miu.990005041170106381 ‡aMiU ‡bSDR ‡cMIU ‡pmdp.39015000483126 ‡sMIU ‡z1969 ‡1990005041170106381
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