| LDR | 00993nam a22003011a 4500 | ||
| 001 | 000273617 | ||
| 003 | MiAaHDL | ||
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| 006 | m d | ||
| 007 | cr bn ---auaua | ||
| 008 | 880718s1982 nyua b 10100 eng | ||
| 010 | ⊔ | ⊔ | ‡a82008816 |
| 020 | ⊔ | ⊔ | ‡a0125588208 |
| 035 | ⊔ | ⊔ | ‡a(MiU)990002736170106381 |
| 035 | ⊔ | ⊔ | ‡asdr-miu.990002736170106381 |
| 035 | ⊔ | ⊔ | ‡z(MiU)MIU01000000000000000273617-goog |
| 035 | ⊔ | ⊔ | ‡a(OCoLC)8476544 |
| 035 | ⊔ | ⊔ | ‡a(CaOTULAS)160502205 |
| 035 | ⊔ | ⊔ | ‡a(RLIN)MIUG83-B7101 |
| 035 | ⊔ | ⊔ | ‡z(MiU)Aleph000273617 |
| 050 | 0 | ⊔ | ‡aTA1673 ‡b.L34 1982 |
| 082 | 0 | ⊔ | ‡a621.3815/2 ‡219 |
| 245 | 0 | 0 | ‡aLaser annealing of semiconductors / ‡cedited by J.M. Poate, James W. Mayer. |
| 260 | ⊔ | ⊔ | ‡aNew York : ‡bAcademic Press, ‡c1982. |
| 300 | ⊔ | ⊔ | ‡axi, 564 p. ‡bill. ; ‡c24 cm. |
| 504 | ⊔ | ⊔ | ‡aIncludes bibliographies and index. |
| 538 | ⊔ | ⊔ | ‡aMode of access: Internet. |
| 650 | ⊔ | 0 | ‡aSemiconductors |
| 650 | ⊔ | 0 | ‡aSemiconductor industry ‡xLaser use in ‡xCongresses. |
| 700 | 1 | ⊔ | ‡aMayer, James W., ‡d1930- |
| 700 | 1 | ⊔ | ‡aPoate, J. M. |
| 899 | ⊔ | ⊔ | ‡a39015002124967 |
| CID | ⊔ | ⊔ | ‡a000273617 |
| DAT | 0 | ⊔ | ‡a19880718000000.0 ‡b20220528000000.0 |
| DAT | 1 | ⊔ | ‡a20220529060727.0 ‡b2023-04-13T17:31:08Z |
| CAT | ⊔ | ⊔ | ‡aSDR-MIU ‡dALMA ‡lprepare.pl-004-008 |
| FMT | ⊔ | ⊔ | ‡aBK |
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| 974 | ⊔ | ⊔ | ‡bMIU ‡cMIU ‡d20230413 ‡sgoogle ‡umdp.39015002124967 ‡y1982 ‡ric ‡qbib ‡tUS bib date1 >= 1929 |